Leybold semi-automatic Z550 cathode sputtering system equipped with:
* Three PK150 magnetron sputtering cathodes (diameter 150 mm)
* Hüttinger 2,5 kW RF sputtering power supply, type IS 2,5/13560S, with integrated matching unit
* substrate table with water cooling and with RF-bias/RF-etching.
* special flange to increase the high of the vacuum chamber so sputtering of higher substrates is possible
* Mechanical prevacuum pump with Leybold diffusion pump
* operating voltage: 380/400 VAC, 50 Hz.